Semiconductor Lithography Sector Continues to Outperform Semiconductor Equipment Market

High-priced equipment enabled the semiconductor lithography sector to grow to 25% of entire front-end equipment processing market in 2008, according to the report “Sub-100nm Lithography: Market Analysis and Strategic Issues.”

Lithography revenues dropped 25.1% in 2008, less than the 32.0% drop for the entire semiconductor front-end equipment market. Growth was attributed to significant increases in average selling prices (ASPs) of the lithography tools due to the switch to advanced ArF systems. ASPs increased 43.2% while unit shipments decreased 47.3%.

For 2008, ASML (ASML) held the lead in unit shipments with a 39.0% share followed by Canon (CAJ) with a 33.7% share.

On a revenue basis, ASML retained the lead in the market with a 66.4% share in 2008 followed by Nikon with a 21.4% share.

The large growth in immersion DUV-based tools will continue to be responsible for the high growth in ASPs. Immersion 248nm tools cost $42 million each versus $27 million for dry.

Cost of Ownership calculations indicate that end users will realize significant cost savings from EUVL compared with immersion/double patterning at 22 nm. However, these tools will be priced at close to $90 million each.

Disclosure: No position.

Comments

[mvasconi:]

The wavelength for most advanced lithography tools (including immersion) is 193nm, and not 248nm

Mar 26 09:13 AM