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The process control solutions of Nanometrics Incorporated (Nasdaq:NANO) are deployed throughout the fabrication process, from front-end-of-line substrate manufacturing, to high-volume production of semiconductors and other devices, to advanced wafer-scale packaging applications. The systems of Nanometrics enable device manufacturers to improve yields, increase productivity and lower their manufacturing costs. Nanometrics maintains its headquarters in Milpitas, California, with sales and service offices worldwide.

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Nanometrics yesterday announced its Atlas® XP+ optical critical dimension (OCD) system has been selected by a leading disk drive manufacturer for process control metrology with follow-on orders at multiple fabs. The system orders follow the successful installation of an initial Atlas XP+ system, which was selected over an incumbent competitive product. In its position as “tool of record,” the Atlas system will be used to provide OCD metrology in the production of the customer’s next generation thin-film heads.

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